发明名称 FILM FORMATION
摘要 PURPOSE:To obtain a uniformly thick and characteristic film by moving a filmy support substance forming an amorphous Si film in a decompression and reaction chamber wherein a plurality of electrodes composing two pieces as a pair are vertically provided on the substance and predetermined gas is flowed to the electrods and predetermined gas is flowed to the electrodes and Si films are accumulated by glow discharge. CONSTITUTION:A supply roller 102 and a take-up roller 105 are provided in a decompression and reaction chamber 101 and a filmy support substance 103 with predetermined length is moved between the rollers and the substance 103 is supported by a guide support plate 104 providing a heater 106 at the reverse side of the plate 104. And a plurality of plated electrodes 107 with a slight gap each other are arranged under vertical condition and at certain intervals on the substance 103. Two electrodes are made as a pair and connections are applied one after the other. And a voltage is applied to the electrodes from a power source 109 provided at the outside of the chamber 101. Gas guide pipes 108 are also provided to spray gas to each pair of the electrodes, through the pipes 108 and carrier gas such as SiH4, impurities, Ar or the like is sent to the pipes from bombs 110-1-110-3.
申请公布号 JPS5671930(A) 申请公布日期 1981.06.15
申请号 JP19790149726 申请日期 1979.11.19
申请人 CANON KK 发明人 KITAJIMA NOBUO;OGAWA KIYOUSUKE
分类号 H01L31/04;C23C16/50;C23C16/54;G03G5/08;H01L21/205;H01L21/31 主分类号 H01L31/04
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