| 摘要 |
PURPOSE:To make bright part exposure and dark part exposure possible while using one kind of photosensitive substrate in reticle production by forming images in the photosensitive layer on the transparent substrate by the use of a Kalvar method. CONSTITUTION:The photosensitive substrate consisting in providing a photosensitive layer 1 comprising a transparent resin (polyvinyl chloride, polystyrene or the like) uniformly dispersed with diazonium salt on a transparent substrate 2 is used. More specifically, a desired mask pattern is exposed 3 on the photosensitive substrate kept at about 40 deg.C by using a pattern generator, to form a latent image of N2 gas in the photosensitive layer 1. Next, this is heated to soften the photosensitive layer 2, and expand the N2 gas to allow an image (opaque part) 4 consisting of fine bubbles to form. Thence, while the photosensitive layer 2 is being kept at its softening temp. or under, it is irradiated over the entire surface at the quantity of light about 2-4 times the proper exposure. The N2 gas generated by this is diffused to the outside of the photosensitive layer 2 and is thereby removed, and this completes fixing and the negative type reticle is thus obtained. It is possible to obtain a positive type reticle if the treatments are made in order of selective exposure, ordinary temp. standing, full surface exposure and heating. |
