| 摘要 |
PURPOSE:To elevate the reproducibility and yield of an oxide magnetic thin film when the ferromagnetic thin film is to be formed on a substrate by spattering using Fe3O4 or Fe3O4 containing additive as a target by a method wherein preliminary spattering is performed, the target is exposed in a low oxygen partial pressure to remove O2 gas. CONSTITUTION:The target of Fe3O4 or Fe3O4 containing additive and the substrate to be adhered on it are put in a spattering device, and the pressure in the device is kept at 8X10<-2>Torr. After the preliminary spattering is performed for about 5min, the pressure is reduced and is exhausted once to remove O2 gas, and the main spattering is performed again in the same gas pressure. At this time, at the interval between the spattering of preliminary and main, the treatment as follows is performed. After the preliminary spattering, the target is exposed in the atmosphere having the oxygen partial pressure of 1X10<-6>Torr or less, then the main spattering is performed in the prescribed atmosphere. By this way, O2 gas discharged from the target is removed sufficiently, and the saturated magnetic flux density of the oxide magnetic thin film is stabilized. |
