| 摘要 |
PURPOSE:To miniaturize the subject device and to uniformalize the quantity of ion injection by a method wherein a radial wafer holder, having a wafer attaching plate, is provided in a hollow ion injecting chamber having an ion beam incidenting window, and the wafer holder is moved toward circumferential direction while it is rotated. CONSTITUTION:A rotary disc 9, having a plurality of rectangular holes 41 on its peripheral region, is placed in a discoid ion injecting chamber 8, having a hollowed inside and an ion-beam 4 incidenting window on one end, and it is rotated at a constant speed by a pulse motor 36a. Also on the reverse side of the disc 9, a wafer holder 42 which rotates in synchronization with the disc 9 is provided and a wafer 7 attaching plate is provided in front of the disc 9 corresponding to the rectangular hole 41 and the beam incidenting window using a coupling mechanism. With this construction, the beam incidented into the rectangular hole 41, having the larger diameter than that of the wafer 7, is detected by rotating the holder 42, and the holder 42 is moved up and down to the circumferential direction by a position controlling circuit 38 and a pulse motor 36b. |
