发明名称 ENHANCING EPITAXY AND PREFERRED ORIENTATION
摘要 <p>An array of oriented artificial relief features or artificial point defects embraced by parallel planes on a substrate surface influence the orientation of solid films during the course of their growth on the substrate surface. There may be multiple sets embraced in generally parallel planes at an angle to each other that is an integral multiple of 30.degree.. Although there are many important technological opportunities for the application of preferred orientation and epitaxial films, particularly in electronic, acoustic and optical devices, with a few notable exceptions, such films have not been consistently obtained with sufficient quality or in a sufficient number of combinations and orientations to meet the requirements.</p>
申请公布号 CA1102223(A) 申请公布日期 1981.06.02
申请号 CA19780298810 申请日期 1978.03.13
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY 发明人 SMITH, HENRY I.
分类号 (IPC1-7):01J17/00 主分类号 (IPC1-7):01J17/00
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