发明名称 VAPOR DEPOSITING APPARATUS
摘要 PURPOSE:To produce an orientation effect in diagonal vapor deposition and enhance the film forming efficiency by placing an evaporation source and a vapor ionizing means, diagonally setting a vapor control plate of positive potential over the source, and providing an inert gas introducing means, etc. CONSTITUTION:Vacuum chamber 3 is formed in bell jar 1, and this apparatus is composed essentially of evaporation source 5, high frequency coil 7 of ionizing means 6 for ionizing vapor from source 5, vapor control plate 8 of positive potential diagonally set over source 5, inert gas introducing pipe 12 and holder 10 of substrate 9 receiving a vapor flow of evaporating substance 20. Substance 20 melted in source 5 is positively ionized, repulsed by plate 8, diagonally blown up along plate 8 by inert gas from the arrow A direction, and vapor deposited on substrate 9 of negative potential. Thus, the film forming speed can be increased, and the film forming efficiency as well as the orientation effect can be enhanced.
申请公布号 JPS5662963(A) 申请公布日期 1981.05.29
申请号 JP19790139290 申请日期 1979.10.30
申请人 TDK ELECTRONICS CO LTD 发明人 KAMETANI MINORU
分类号 C23C14/32;G11B5/85 主分类号 C23C14/32
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