发明名称 Device for the projection printing of the masks of a mask set onto a semiconductor substrate
摘要 A device for the projection printing of the masks of a mask set onto a semiconductor substrate comprising a projection lens for imaging the patterns of said masks on photosensitive layers of said substrate. Alignment patterns are disposed said masks and alignment targets on said substrate. Said alignment patterns of at least one of said masks and said alignment targets of said substrate are positioned in non-conjugated areas in respect of the projection lens, i.e. in areas which cannot be imaged into one another by means of said projection lens. For the alignment process between said mask and said substrate auxiliary optical means are provided, said alignment targets of said substrate and said alignment patterns of said mask being imaged into one another by means of said auxiliary optical means.
申请公布号 US4269505(A) 申请公布日期 1981.05.26
申请号 US19790083532 申请日期 1979.10.10
申请人 CENSOR PATENT-UND VERSUCHS-ANSTALT 发明人 MAYER, HERBERT E.
分类号 G03B27/32;G03F9/00;H01L21/027;H01L21/30;(IPC1-7):G03B27/52 主分类号 G03B27/32
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