| 摘要 |
PURPOSE:To manufacture the high efficiency head which is short in the magnetic gap length, by using specific types of materials respectively as insulating film for the magnetic gap constitution and for others, and leaving the insulation film only for the gas constitution, in plasma etching. CONSTITUTION:On a substrate 1 providing a lower magnetic substance 2, a magnetic gap constituting insulation film 9 consisting of a film hardly etched with plasma of fluoride gas is provided, and conductor coils 13, 14, 15 and insulation films 10, 11, 12 made of Si3N4 are alternately laminated on the film 9, and the lower magnetic substance 2 is exposed by removing insulation films 9, 10, 11, 12 for the part shown in a symbol 7. Next, the core tip is plasma-etched to remove only the insulation films 10, 11, 12 and to leave the insulation film 9, then an upper magnetic substance 8 is formed on the entire upper side of the substrate 1 to constitute the thin film magnetic head having a magnetic gap length A. |
