发明名称 PHOTOMASK ORIGINAL PLATE FORMING METHOD AND APPARATUS
摘要 PURPOSE:To obtain a plurality of transferred and arranged photomask original plates by setting a light source section and a 1:1 transfer lens with the 1st original plate of a photomask in-between and using an apparatus including a movable stage which moves according to the image size of the plate and a control section. CONSTITUTION:Movable cylindrical tube 2 is placed on cylindrical tube 1 with turn table 5 in-between, and light source 3 and collimating lens 4 are set in tube 2 with filter 21 in-between. Tube 1 is fixed to base 18 at leg 7. On base 18 Y driving stage 14, Y driving motor 16, Y linear encoder 17 and Y linear scale 15 are arranged, and on stage 14 X driving stage 10, X driving motor 10, etc. are arranged. 1:1 Transfer lens 8 is attached to the lower end of tube 1. The 1st original plate 6 is held on tube 1 with vacuum chuck 20, and photosensitive material 9 for a mask on stage 10 with vacuum chuck 22. Thus, many original plates can be copied efficiently in a short time.
申请公布号 JPS5660436(A) 申请公布日期 1981.05.25
申请号 JP19790136852 申请日期 1979.10.23
申请人 NIPPON ELECTRIC CO 发明人 KAWASAKI FUMINORI;OBATA TAKESHIGE
分类号 H01L21/30;G03F1/00;G03F1/54;H01L21/027 主分类号 H01L21/30
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