| 摘要 |
PURPOSE:To enable an integrated circuit to be manufactured correctly and efficiently in an ordinary etching process by using at least one of a plurality of arranged mask patterns as an etching monitor chip forming pattern composed of a white pattern and a black pattern. CONSTITUTION:A plurality of mask patterns 2 for an integrated circuit are arranged longitudinally and laterally on glass surface 1 of a photomask, and one of patterns 2 is used as etching monitor chip forming mask pattern 3. When pattern 3 is magnified, in the square region corresponding to the area of one chip of the circuit rectangular white pattern 4 and rectangular black pattern 5 each having the length of one side of the region as the longitudinal size are combined in the form of a lattice. When a film part with two kinds of thickness is etched, white pattern 4' is partially superposed on the position of black pattern 5' of the etching monitor chip forming pattern of other photomask having the same combination for the circuit. |
