| 摘要 |
PURPOSE:To obtain the ion implanter miniaturized with high reliability by a method wherein a motor to drive a disk on which a wafer is installed is arranged outside a device through vacuum seal and coupled to a mechanical scanner through a spline mechanism. CONSTITUTION:A wafer 33 is locked on disks 30, 31, and the disk 30 is rotated by a pulse motor 44. Ion beam 3A of the objective matter is projected into a chamber 8A, the disk 30 is moved vertically by a pulse motor 60, and thus the ion beam 3A is implanted uniformly in the wafer 33 by said rotation and vertical move of the disk. Next, the disk 31 is rotated by a pulse motor 45 and stopped when a through hole of the disk 30 comes to a position whereat the beam 3A is incident by controlling the pulse motor 44, and then the beam 3A is implanted uniformly through the hole by said rotation and vertical move alike. The motors 44, 45, 60 are installed in the chamber 8A through rotating vacuum seals 48, 49, 62 and coupled to driving means 30A, 31A with spline mechanisms 50, 51. A continuous operation is ready by two plates 30, 31 and the device is miniaturized and high in reliability. |
