发明名称 POLYCHROMATIC DIAZO PHOTOSENSITIVE MATERIAL FOR SECOND ORIGINAL
摘要 PURPOSE:To obtain a polychromatic photosensitive material having a long life and superior work efficiency by forming a diazo type photosensitive layer having a specified value or less or light shielding rate after development on a light transmitting support and then forming the 2nd diazo type photosensitive layer on the above-mentioned layer so that the combined light shielding rate is adjusted to a specified value or more. CONSTITUTION:On transparent or translucent support 2 photosensitive layer 3 having <=80% light shielding rate and contg. a photosensitive diazonium compound and a coupling component is formed, and on layer 3 other diazo type photosensitive layer 4 is formed so that the combined light shielding rate of layers 3, 4 is adjusted to >=80%. The resulting polychromatic photosensitive material 1 for the 2nd original is exposed R through original 7 having images 5, 6 and developed to obtain images 8, 9, 10, 11. Image parts 10', 11' to be separated in color are removed by scraping or other method to obtain the 2nd original 12, which is then superposed on photosensitive material 15 having dichromatic photosensitive layer 13 and exposed R. Thus, dichromatic copy images 16, 16', 17, 17' are obtd. by a coupling speed difference between parts of layer 13 corresponding to the superposed parts of images 8, 9 and images 10, 11 having >=80% light shielding rate and the parts of images 8, 9 along having <= light shielding rate.
申请公布号 JPS5654431(A) 申请公布日期 1981.05.14
申请号 JP19790129991 申请日期 1979.10.11
申请人 RICOH KK 发明人 NISHIZAKI TOSHINAGA;SHIRAISHI SHIYUUHEI;IIYAMA KIYOTAKA
分类号 G03C1/52;G03C5/18 主分类号 G03C1/52
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