| 摘要 |
When a highly resistive GaAs film doped with a metal impurity such as Fe, Ni or Cr is epitaxially grown from the vapor phase, a metallocene of this metal impurity such as Fe(C5H5)2, Cr(C5H5)2 or Ni(C5H5)2 or a derivative of this metallocene is employed as a starting material of this impurity. Even at room temperature or a temperature lower than room temperature a metallocene or a derivative thereof has such a high vapor pressure as to permit the epitaxial growth of a semi-insulating film so that heating of a line for feeding an impurity into a reaction tube may be eliminated and consequently an epitaxial system may be much simplified. Furthermore introduction of the impurity into the reaction tube may be instantaneously started or stopped by opening or closing a stop valve inserted into the feed line so that the impurity distribution may be sharply changed from one semi-insulating epitaxially grown film to another. |
