发明名称 Process of vapor depositing photoconductive material.
摘要 <p>A process of vapor depositing photoconductive material. The process is particularly suitable for preparing arsenic-selenium photoreceptors wherein the arsenic distribution in the photoreceptor, particularly at its top surface, is controlled within a preferred concentration range. The process comprises controlling the evaporation rate of the arsenic-selenium alloy by means of a crucible weight sensing system to monitor alloy depletion rate and a cascade dual-loop feedback control system processing both crucible assembly weight change and temperature to modify resistive power input to the crucible.</p>
申请公布号 EP0028514(A1) 申请公布日期 1981.05.13
申请号 EP19800303880 申请日期 1980.10.30
申请人 XEROX CORPORATION 发明人 HORDON, MONROE J.;GERACE, ROBERT E.
分类号 G03G5/082;C23C14/54;H01L31/0264;H01L31/18;(IPC1-7):23C13/04 主分类号 G03G5/082
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