Process and device for depositing a metal oxide film.

摘要

1. A method of depositing a film of metallic oxides on a support, consisting of providing the starting materials in the form of vapour which a stream of carrier gas directs towards the support which is heated so as to cause their thermal decomposition, characterised in that the starting materials in powder form are introduced, dispersed and put in suspension continuously in the stream of carrier gas passing through piping, then said starting materials are vapourised in the carrier gas by heating a downstream portion of said piping before intimate mixing of the vapour of the starting materials and the carrier gas in an enlarged section of said portion.