| 摘要 |
PURPOSE:To reproduce an accurate pattern by a method wherein developing or etching treating time can precisely be set at all times even when a temperature of a treating liquid, heat thereof is insulated, changes. CONSTITUTION:A timer 30 is started by a starting signal 29, the opening and closing of a nozzle are controlled 18, and a wafer is coated with a treating liquid in a rotary shape. The liquid temperature is detected 19, read corresponding to sampling pulses 21, and memorized 20. The temperature is A/D converted 22, compared 23 with reference temperature 24 and reach synchronizing with sampling pulses, integrating temperature mean is computed, and difference with the reference liquid temperature is calculated 25. Correcting instructions are taken out 27 on the basis of difference information, corresponding treating time is computed 28 and compared with the count of the timer 30, and completion instructions are emitted when treating time calculated and the time elapsed agree. According to this constitution, accurate treating time can be set at all times, and a precise pattern can be reproduced. |
