发明名称 |
Negative type deep ultraviolet resist |
摘要 |
A negative type resist is provided for deep ultraviolet light lithography. This resist comprises a polymer of a diallyl ester of a dicarboxylic acid having a degree of dispersion of 3 or less, which is given by the ratio of a weight-average molecular weight Mw to a number-average molecular weight Mn. This deep UV resist can produce a fine detail resist pattern having a high resolution, and it has a high sensitivity to irradiating the coated film of the polymer on a substrate with deep UV light followed by development.
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申请公布号 |
US4267258(A) |
申请公布日期 |
1981.05.12 |
申请号 |
US19790101688 |
申请日期 |
1979.12.10 |
申请人 |
FUJITSU LIMITED |
发明人 |
YONEDA, YASUHIRO;KITAMURA, KENRO;NAITO, JIRO;KITAKOHJI, TOSHISUKE |
分类号 |
G03F7/20;G03F7/038;H01L21/027;(IPC1-7):G03C1/68 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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