发明名称 PHOTOSENSITIVE POLYAMIDE COMPOSITION
摘要 PURPOSE:To provide a photosensitive polyamide composition having enhanced photocrosslinking density and giving a proper relief by blending soluble polyamide with specified tri-, di- and monofunctional unsatd. monomers. CONSTITUTION:100pts.wt. soluble polyamide is blended with 0.5-20pts.wt. tri(meth)acryloylhexahydro-S-triazine, 0.5-20pts.wt. N,N'-hexamethylenebisacrylamide and 0.5-100pts.wt. one or more kinds of monofunctional unsatd. monomers selected from N-tert-butyl-(meth)acrylamide, (meth)acrylamide, N-methylol(meth) acrylamide and diacetoacrylamide. In this range of blending ratio the compatibility of the polyamide with the unsatd. monomers is improved. The resulting composition is not swollen even by elution and can be dried in a short time. Thus, a relief having a proper shoulder angle is obtd.
申请公布号 JPS5652744(A) 申请公布日期 1981.05.12
申请号 JP19790130200 申请日期 1979.10.08
申请人 UNITIKA LTD 发明人 SAKAMOTO IZUMI;MITSUI MINORU
分类号 C08F2/00;C08F2/44;C08F2/48;C08F20/00;C08F20/10;G03F7/037;G03F7/038 主分类号 C08F2/00
代理机构 代理人
主权项
地址