| 摘要 |
PURPOSE:To allow a photosensitive material to effectively show antistatic action even at low humidity without exerting unfavorable influence on the photographic characteristics by adding a (co)polymer having repeating units each having a betaine structure part to the undercoated layer or backing layer. CONSTITUTION:To the undercoated layer or backing layer of a photosensitive material is added a (co)polymer having reapting units each having a betaine structure part represented by the formula (where each of R1 and R4 is H or CH3, R5 is 1-3C alkyl, each of R2 and R3 is 1-6C alkyl, p is 2-6, q is 1-4 when R4 is H and 1 when R4 is CH3 and D is COO or SO3). Thus, a hydrophilic colloid layer is prevented from being unevenly coated onto the support film owing to electrification, and the formation of a static mark due to the contact of emulsion surfaces and the contact of the photosensitive material with rubber, metal, plastics and fluorescent intensifying screen is prevented. |
