发明名称 |
Resistance thermometer with stable linear characteristic to high temp. - has insulating substrate with rhodium or iridium thin film resistor |
摘要 |
<p>Resistance thermometer with linear characteristic consists of an electrically insulating substrate with a metal thin film resistor, consisting of Rh or Ir. Pref. Rh or Ir films are applied by cathodic sputtering with Kr and/or Xe or a gas mixt. contg. min. 50 vol.% Kr and/or Xe as operating gas and a bias is applied to the substrate during the deposition process. The metal films are then tempered in an inert atmos. Thermometer has a stable linear characteristics up to 500 deg.C and has a high temp. coefft. of resistance similar to that of the Pt resistance thermometer.</p> |
申请公布号 |
DE2941995(A1) |
申请公布日期 |
1981.04.30 |
申请号 |
DE19792941995 |
申请日期 |
1979.10.17 |
申请人 |
DEGUSSA AG |
发明人 |
DIEHL,DIPL.-PHYS.DR.,WALTER;KOEHLER,WOLFGANG,DR. |
分类号 |
G01K7/18;H01C7/02;(IPC1-7):01K7/18 |
主分类号 |
G01K7/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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