| 摘要 |
PURPOSE:To enable the fine processing by using the etching liquid for Mo containing iodic acid. CONSTITUTION:This iodic acid containing etching liquid is prepared by using water, an aqueous ammonia solution and an org. solvent forming a mixed solution with water and the concn. of iodic acid is adjusted to 0.03-1wt%. This etching liquid has a rapid etching speed for Mo and can form fine patterns on a surface or a thin layer. |
