发明名称 |
Cleaning process for p-type silicon surface |
摘要 |
A cleaning process for a silicon surface, especially a p-type silicon surface. The surface is exposed to HF/H2O fumes, thereby obtaining a hexafluosilicic acid film on the surface. The exposed surface is then treated with a water-based, oxidizing, non-silicon-etchant cleaning agent. There is no intermediate rinse between the latter two steps.
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申请公布号 |
US4264374(A) |
申请公布日期 |
1981.04.28 |
申请号 |
US19800153796 |
申请日期 |
1980.05.28 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BEYER, KLAUS D.;KASTL, ROBERT H. |
分类号 |
H01L21/02;H01L21/306;H01L21/311;(IPC1-7):B08B7/04 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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