FORMATION OF MICROMINIATURE ELECTRODE

摘要

PURPOSE:To obtain a microminiature electrode by laminating two types of photoresist films having different sensitivities and forming a mask. CONSTITUTION:Photoresists 2a, 2b are laminated on a substrate 1 in such a manner that the resist 2b has higher sensitivitg than the resist 2a. When forming an exposure region 4, the region 4b has wider width than the region 4a. When it is developed, the window 5a is opened to be larger than the window 5b. When electrode materials are deposited as designated by 6 and 7 and the resist mask 2 and the film 7 are removed, a desired microminiature electrode 6 can be obtained.