发明名称 MANUFACTURE OF MASK FOR INTEGRATED CIRCUIT
摘要 PURPOSE:To prevent the damage of a master mask due to electrostatic discharge by introducing an ionized gas to neutralize static electricity before separating the master mask closely contacting with a substrate for a copy mask. CONSTITUTION:Master mask 11 is mounted on support stand 12, and airtight chamber 13 is evacuated through small hole 14. Substrate 15 for a copy mask is mounted on support stand 16, airtight chamber 17 is evacuated through small hole 18, and airtight chamber 19 where mask 11 and substrate 15 closely contact with each other is also evacuated. Next, chamber 13 alone is returned to atmospheric pressure, and mask 11 is irradiated with ultraviolet rays from the rear side to expose a resist film on substrate 15. An ionized gas is then introduced into chamber 19 to neutralize static electricity generated on the contact surfaces, and while feeding the gas to atmospheric pressure, chamber 13 of the mask 11 side is evacuated to separate the contact surfaces of mask 11 and substrate 15.
申请公布号 JPS5646226(A) 申请公布日期 1981.04.27
申请号 JP19790120849 申请日期 1979.09.21
申请人 OKI ELECTRIC IND CO LTD 发明人 SHIMIZU HIROSHI;KAGII TAKAO
分类号 G03F1/00;G03F1/76;G03F7/20;H01L21/027 主分类号 G03F1/00
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