ELECTRON BEAM LITHOGRAPHY APPARATUS

摘要

PURPOSE:To permit the correction of all the rotation error angles of an electron beam lithography apparatus without prealignment outside the apparatus by rotating a deflecting coil to correct the rotation error and feedbacking the correcting angle to the moving table. CONSTITUTION:A mark detection functioning unit 18 detects the mark end of a sample having reference marks, and a signal processing unit 17 obtains the barycentric coordinates of the two reference marks and calculates a rotation correcting angle theta. The signal corresponding to the angle causes a deflecting coil rotating source 11 to actuate a deflecting coil 16 to rotate by the rotation correcting angle. Thus, the rotation error angle theta made by the sample and a moving table 8 is corrected. This permits the rotation correction of the lithography field of even a sample which has a rotation error too large for an electrical correction.