发明名称 MOS MEMORY CELL
摘要 PURPOSE:To decrease false operation due to alpha rays by a method wherein a means is mounted by which electrons or holes generated in a silicon substrate due to alpha rays cannot reach to a capacitor region. CONSTITUTION:Memorized informations are written into the capacitor region 2 in such a manner that voltage corresponding to the contents of the writing-in is given to an n<+> type silicon region 8, a transistor region 3 is conducted by driving the second polysilicon layer 7 forming the gate of the transistor region 3 and the informations are written into the capacitor region 2, and the gate of the transistor 3 is grounded and broken. Electrons or holes generated due to alpha rays are interrupted by a silicon oxide film 10.
申请公布号 JPS5643752(A) 申请公布日期 1981.04.22
申请号 JP19790119521 申请日期 1979.09.17
申请人 MITSUBISHI ELECTRIC CORP 发明人 TSUBOUCHI NATSUO;DENDA MASAHIKO;HIRATA KATSUHIRO;KINOSHITA SHIGEJI;HARADA HIROJI;ABE HARUHIKO
分类号 H01L27/10;H01L21/822;H01L21/8242;H01L27/04;H01L27/108;H01L29/94 主分类号 H01L27/10
代理机构 代理人
主权项
地址