发明名称 PRODUCTION OF PHOTOCIRCUIT
摘要 PURPOSE:To simultaneously form plural optical guides by burying the optical guides of the size identical to that of the cores of low-loss optical fibers in the grooves of a substrate. CONSTITUTION:A film 2 of SiO2 or the like is formed on the surface of a substrate 1 such as silicon and the film 2 is selectively removed by photoetching according to predetermined patterns to expose the Si substrate surface. Next, with the SiO2 film 2 as a mask, etching is performed to form predetermined pattern grooves. After this, the part where the SiO2 film has remained are once completely removed and a thin SiO2 film 3 is newly deposited over the entire part of the substrate including the bottom of the grooves by a CVD method or the like to form part of clad, thence a glass layer 4 of a refractive index higher than that of the film 3 is deposited thickly thereon through CVD. The other parts are removed by etching or the like by leaving the glass 4 in the grooves of the substrate to make cores, and finally an SiO2 layer 2' is deposited on the flat surface to form a clad.
申请公布号 JPS5642204(A) 申请公布日期 1981.04.20
申请号 JP19790118267 申请日期 1979.09.14
申请人 FUJITSU LTD 发明人 SUGIKI YASUHIRO
分类号 G02B6/122;G02B6/13;G02B6/136 主分类号 G02B6/122
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