发明名称 MANUFACTURE OF PHOTOMASK
摘要 PURPOSE:To easily correct the pinhole of a hard mask by applying and bonding a dye shielding ultraviolet light and visible light to the pinhole part. CONSTITUTION:Mixed fluid 24 of carbon black diluted with polyvinyl alcohol is applied to the whole surface of glass substrate 23 having metal mask pattern 22 with pinhole 21 generated, and the back side of substrate 23 is irradiated with light source 25. Pinhole 21 is inspected with upper microscope 26, and when it is detected, microscope 26 is moved. By irradiating fluid 24 with laser beams, the solvent is spattered to bond the dye. Thus, pinhole 21 is allowed to disappear. After detecting pinhole 21 with a detector composed of a lens and a photomultiplier, the dye may be dropped into the pinhole from a nozzle and bonded.
申请公布号 JPS5642235(A) 申请公布日期 1981.04.20
申请号 JP19790118256 申请日期 1979.09.14
申请人 FUJITSU LTD 发明人 KOBAYASHI KENICHI
分类号 G03F1/00;G03F1/72;H01L21/027 主分类号 G03F1/00
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