发明名称 EVALUATION FOR WAFER WASHING
摘要 PURPOSE:To enable to judge the washing effect of Si particles elimination quantitatively by a method wherein HF treated Si substrate is dried to be a monitor piece after it is immersed in Se particles suspended aqueous solution. CONSTITUTION:The Si piece of appropriate size is washed and immersed in the HF solution to make the surfase therof as a water-repellent, washed and dried. The Si suspension that Si particles of the particle size 0.1-1mum is dispersed uniformly in a distilled water is prepared. When the treatment completed Si piece is immersed and dried to make the monitoring piece, the number of particles, approximately 2,000 pieces/cm<2> can be readily obtained. The washing effect of a washing liquid can be quantitatively judged by the difference of the particle attaching density before and after the test of monitoring piece.
申请公布号 JPS5642344(A) 申请公布日期 1981.04.20
申请号 JP19790118257 申请日期 1979.09.14
申请人 FUJITSU LTD 发明人 OZAWA HIDEAKI
分类号 H01L21/304;(IPC1-7):01L21/304 主分类号 H01L21/304
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