| 摘要 |
PURPOSE:To perform a high speed blanking and the electron beam drawing by a method wherein the voltage deflecting the electron beam is properly selected. CONSTITUTION:In the case of the long time blanking, the output of inverters 9, 11 go high level, switching elements 10, 12 become both off. Accordingly, voltages Va,-Vb is applied to blanking plates 6, the electron beam 2b is deflected in a large scale. When it is not blanking, since the output of the inverters 9, 11 go both low level, the switching elements 10, 12 both become ON, the deflection voltage at the blanking plates 6 becomes zero and the electron beam 2c passes through a aperture 7. In the case of a short time blanking such as the drawing or other, the voltage applied to the deflector 6 is reduced, the ON and OFF control of the blanking is made. In the constitution, the high speed drawing is possible to perform and the leaking of electron beam from the aperture 7 is not generated at the time of sample exchange etc. |
