发明名称 Self aligned schottky guard ring
摘要 A method of forming a self aligned guard ring surrounding a schottky barrier diode device without requiring an enlargement of the final schottky barrier device. The method involves creating an overhanging opening in a insulator layer overlying a semiconductor body to expose the schottky contact area on the surface of the semiconductor body, depositing a diffusion barrier material such as molybdenum in the opening, the deposit being of the same size as the smallest part of the overhanging opening so that a guard ring can be formed from a vapor by diffusion around the deposited barrier material.
申请公布号 US4261095(A) 申请公布日期 1981.04.14
申请号 US19780968052 申请日期 1978.12.11
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DREVES, RICHARD F.;FRESIA, JOHN F.;KIM, SANG U.;LAJZA, JR., JOHN J.
分类号 H01L21/033;H01L21/22;H01L21/28;H01L21/331;H01L21/338;H01L29/47;H01L29/73;H01L29/872;(IPC1-7):H01L21/28 主分类号 H01L21/033
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