Method for applying photographic resist to otherwise incompatible substrates

摘要

A new and improved method for applying photographic resists to otherwise incompatible substrates, such as, for example, a baking enamel paint surface, is described wherein the uncured enamel paint surface is coated with a non-curing lacquer which is, in turn, coated with a partially cured lacquer. The non-curing lacquer adheres to the enamel and a photo resist material will satisfactorily adhere to the partially cured lacquer. Once normal photo etching techniques are employed the lacquer coats can be easily removed from the enamel leaving the photo etched image. This invention is particularly applicable to preparation of edge-lighted instrument panels. In such case a coat of uncured enamel is placed over the cured enamel followed by the lacquer coats and the photo resists which is exposed and developed in the normal way. Once the uncured enamel, now having had the image etched upon it, is cured, the lacquer coats are removed leaving an etched panel.