| 发明名称 |
Positive resist for electron beam and x-ray lithography and method of using same |
| 摘要 |
Copolymers of an aziridine and sulfur dioxide are disclosed which are useful as positive radiation resists for use in electron beam and x-ray lithography.
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| 申请公布号 |
US4262083(A) |
申请公布日期 |
1981.04.14 |
| 申请号 |
US19790076673 |
申请日期 |
1979.09.18 |
| 申请人 |
RCA CORPORATION |
发明人 |
PAMPALONE, THOMAS R.;DESAI, NITIN V.;POLINIAK, EUGENE S. |
| 分类号 |
C08G75/30;G03F7/039;(IPC1-7):B05D3/06 |
主分类号 |
C08G75/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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