| 摘要 |
PURPOSE:To enable an 0-quinone diazide type photosensitive material to be used in both negative and positive workings under the same processing conditions. CONSTITUTION:In the positive working of a photosensitive material contg. an o-quinone diazide compound and an imidazole deriv. in the photosensitive layer, the material is imagewise exposed and then developed with alkali. In the negative working, the material is heated to about 70-300 deg.C and irradiated with activated rays of light simultaneously with or after imagewise exposure, and then alkali development is carried out. Heating facilitates the insolubilization of the exposed part, and the irradiation enables the unexposed part to be removed by development. the imidazole deriv. includes imidazole, 2-methylimidazole, 2-ethylimidazole, 2,4-dimethylimidazole, N-methylimidazole and 2,4-diphenylimidazole. |
