发明名称 ION PLATING APPARATUS FOR MICROPARTS
摘要 PURPOSE:To uniformly ion-plate microparts by putting them into a metal basket and installing a means of swinging the basket. CONSTITUTION:Microparts 4 such as wrist watch parts are put into metal basket 3 attached to metal fittings 2 on the top of shaft 1, and in order to apply minus charge, basket 3 is connected to rotating magnet 8 through sliding portion 5, insulating joint 6 and field through collar 7. Magnet 8 is rotated to vertically move both ends of basket 3 around shaft 1 to such a degree that microparts 4 in basket 3 are rolled. Such an apparatus is provided to an ion plating apparatus. Thus, many microparts 4 be plated uniformly with simple structure.
申请公布号 JPS5635765(A) 申请公布日期 1981.04.08
申请号 JP19790111560 申请日期 1979.08.31
申请人 SEIKO INSTR & ELECTRONICS 发明人 SHIMADA KAZUMI
分类号 C23C14/32;C23C14/22 主分类号 C23C14/32
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