Thermal oxidizer for solid bodies - using water vapour - enriched carrier gas as oxidant

摘要

Water is drip fed into a carrier gas stream esp. of oxygen and there evaporated at 120-130 degrees C. The feed rate is 1-4 drops/sec. The equipment is used for surface oxidization of semiconductor bodies e.g. of silicon and has the advantage that it can also be used for dry oxidization merely by shutting off the water feed.