| 摘要 |
<p>During manufacturing of semiconductor circuits by photolithography before irradiation of the photographic lacquer (6), there is provided a transparent coating (7) directly on the photographic lacquer. The dust particles are then fixed at a distance from the lacquer layer (6) so that they have a lesser optical effect. By increasing the overall thickness of the layers (6 and 7) which cover the semiconductor, the probability of occurrence of stationary waves is reduced. </p> |
