发明名称 Waveguide obtained by selective etching method
摘要 The invention provides mainly a selective etching method for the total or partial chemical ablation at certain positions of a metal sheet, and a waveguide obtained by said method. Complete ablation is obtained by etching both faces of the metal sheet. Partial ablation is obtained by etching only one of the faces of the metal sheet. Partial ablation allows grooves and semi-thicknesses to be obtained for forming bends and rabbets for the formation of three dimensional pieces.
申请公布号 US4818962(A) 申请公布日期 1989.04.04
申请号 US19860900483 申请日期 1986.08.26
申请人 THOMSON-CSF 发明人 MOLAINE, ANDRE;POITEVIN, JEAN
分类号 C23F1/04;H01P11/00;(IPC1-7):H01P3/12;H01P3/123 主分类号 C23F1/04
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