发明名称 |
High energy XeBr electric discharge laser |
摘要 |
A high energy XeBr laser for producing coherent radiation at 282 nm. The XeBr laser utilizes an electric discharge as the excitation source to minimize formation of molecular ions thereby minimizing absorption of laser radiation by the active medium. Additionally, HBr is used as the halogen donor which undergoes harpooning reactions with XeM* to form XeBr*.
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申请公布号 |
US4259645(A) |
申请公布日期 |
1981.03.31 |
申请号 |
US19790028778 |
申请日期 |
1979.04.10 |
申请人 |
THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY |
发明人 |
SZE, ROBERT C.;SCOTT, PETER B. |
分类号 |
H01S3/225;(IPC1-7):H01S3/22 |
主分类号 |
H01S3/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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