| 摘要 |
A method of making a transistor array includes forming a plurality of gate electrodes insulated from a semiconductor substrate having an impurity of a given conductivity, introducing a first impurity having a conductivity opposite to that of the given conductivity into a given region of the substrate which is adjacent to an edge of each of the gate electrodes, introducing a second impurity having the given conductivity into given regions adjacent to selected gate electrodes, the second impurity having a significantly higher diffusivity than that of the first impurity in the semiconductor substrate, and driving the second impurity along the surface of the semiconductor substrate to form in the substrate under each of the selected gate electrodes a region having a concentration of impurity of the given conductivity higher than that of the semiconductor substrate. The transistor array may be used, e.g. to make a read only memory (ROM) by connecting appropriate current sensing means to each of the given regions to indicate the presence or absence of the higher diffusivity impurity when a predetermined voltage is applied to the gate electrodes. In one embodiment, the semiconductor substrate is made of P type conductivity, the first impurity is arsenic which produces N type conductivity regions and the second impurity is boron, which produces P type conductivity. Since boron has a higher diffusivity than arsenic, after they are driven by heating the boron impurity produces a high threshold region under the gate electrode when introduced in sufficiently high concentration. |
