| 摘要 |
PURPOSE:To facilitate a check of a product prepared by a photographic etching method, by forming a defect indicating mark on or near the defective pattern of a photomask. CONSTITUTION:A photomask is forwarded in such a manner that its incorrigible defect is not left as it is, but a defect indicating mark, for example, of diameter >=0.1mm., detectable by the naked eye is formed on or near the defect left. The defect indicating mark is usually formed in the range of square 2 corresponding to one device containing defect 3 in the patterns formed on glass substrate 1, and in the case of especially minute devices, only on the square containing defect 3, but also on the adjacent square the defect indicating mark may be attached. Since in such a photomask the defect is exaggerated, the defective product prepared with this photomask can be easily detected by naked-eye check and removed. |
