| 摘要 |
PURPOSE:To enable optimum control of operation by measuring the light emission strength of the desired part of plasma generated between parallel flat plate type electrodes via a slit in parallel with the electrodes. CONSTITUTION:Between a peep window 5 and a spectroscope 4, a slit 9 which is almost in parallel with flat plate electrodes 2 and 6 is installed. Dividing plasma generated between the flat plate electrodes 2 and 6 in layers by moving the slit 9 and the spectroscope 4 in succession, spectrophotometry is carried out in succession. As the state of plasma generation between the electrodes 2 and 6 can be measured, relation between the state of plasma generation and the state of working can be found and optimum control of etching, etc., can be carried out. |
