| 摘要 |
PURPOSE:To form a clear resist pattern without causing air pollution by fixing a photosensitive resin developed with 1,1,1-trichloroethane using a specified fixing soln. CONSTITUTION:A solvent development type photosensitive resin film such as a methyl methacrylate copolymer-base thin film on a substrate is imagewise exposed, developed with 1,1,1-trichloroethane, and fixed with a fixing soln. of a nonpolar nonconjugated compound such as ethylene tetrachloride, octane or fluorocarbon oil. The concn, of trichloroethane in the fixing soln. is gradually increased by repeating fixing, yet little influence is exerted on the power of the fixing soln. |
