| 摘要 |
1396136 Ferromagnetic material; Vapour depositing or sputtering magnetic films INTERNATIONAL BUSINESS MACHINES CORP 2 Nov 1972 [26 Nov 1971] 50453/72 Headings C7A and C7F A ferromagnetic material consists of a mutual solid solution with atomic proportions indicated by the Formula:- or by the Formula:- The material is useful in data storage media as a thin film (e.g. on a non-magnetic substrate) which may be prepared by RF or D.C. sputtering or by vacuum deposition. The substrate, which may be of Al, glass or ceramic, in the form of a disc, strip or drum, may be kept at 25-420‹C during deposition, and the preferred deposition rate is 2-10Š per second. |
