| 摘要 |
PURPOSE:To reduce detecting hours of the positions of reference marks by a method wherein reference marks in the X-Y directions or mesh-like reference marks are formed on a substrate which is to be applied with electron beam scanning, the electron beam scanning is applied at least one time, making it cross reference marks, and the positional coordinates of the reference marks are established in the use of signals obtained. CONSTITUTION:The reference marks extending is X direction and those extending in Y direction or the reference mark 1 which is mesh shaped are formed with a predetermined pitch (a) by etching SiO2 film on a substrate to be scanned with electron beams, and scanned by the electron beam 2 in the direction diagonal to each side of these marks. Thus, differences between the reflection coefficients of SiO2 and the substrate at the time when the beam 2 is reflected on the substrate are obtained, and the detecting signals of positions of the differences are separated ito position detecting signals of X coordinate component and those of Y coordinate component. Then, these values are added together and averaged to obtain the center of the whole mark. |
