| 摘要 |
<p>PURPOSE:To make it possible to form a neck section which is to be an electron discharge section with a high density and uniform dimension and shape by arranging the electron emission section with a thin film shape of insulation member defined by a recess formed by photolithographic processing. CONSTITUTION:An insulation member 2 of a thin film shape with its neck portion 6 arranged with a cut by photolithographic processing is formed on an insulative substrate 1. An electron emitting material 3 made of a thin film is arranged on the insulation member 2. A neck portion 6 of an electron emission section of the electron emitting material 3 is defined by a recess formed by photolithographic processing of the insulation member 2. Further, electrodes 4, 5 for obtaining electric connection are arranged at positions opposing the neck portion on the electron emitting material 3. This makes it possible to form the neck shape with a good reproductivity in a stabilized manner, as the shape of the neck portion 6 is defined by the recess formed by the processing of the easily processed insulation member 2, rather than directly processing the electron emitting material 3.</p> |
