发明名称 |
ADJUSTING FUSED SALT ELECTROLYTIC BATH WITH HIGHER VALENCY SALT |
摘要 |
<p>S P E C I F I C A T I O N T I T L E "METHOD OF ADJUSTING CONCENTRATION OF A COMPONENT IN A FUSED SALT ELECTROLYTIC BATH" A high valency salt, such as TiC14 is reduced to a lower valency salt, such as TiC12 and/or TiC13 within a fused salt electrolytic bath via electrolysis so that an improved electrodeposition of a desired metal or alloy, such as Ti, occurs, from such adjusted bath. The process generally comprises adding a higher valency salt of a desired metal or alloy to a fused salt electrolytic bath, reducing the higher valency salt on a cathode electrode to a lower valency salt, removing the so-produced lower valency salt from the electrode surface and maintaining a predetermined amount of the lower valency salt within the electrolytic bath. Electrodeposition of a desired metal or alloy may then take place from such electrolytic bath containing a soadjusted amount of the lower valency salt.</p> |
申请公布号 |
CA1096810(A) |
申请公布日期 |
1981.03.03 |
申请号 |
CA19770279870 |
申请日期 |
1977.06.03 |
申请人 |
SONY CORPORATION |
发明人 |
TOKUMOTO, SHIN-ICHI;TANAKA, EIJI;KIKUCHI, TATSUO;OGISU, KENJI;TSUMORI, TOSHIRO |
分类号 |
C25C3/26;C25C3/00;C25C3/28;C25D3/66;(IPC1-7):25C3/00 |
主分类号 |
C25C3/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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