| 摘要 |
<p>A metal substrate is coated on at least one surface by vapour deposition with a layer (I) of Ti,max. 2 microns thick; and then at least one layer (II), 0.5-10 microns thick, of TiC, TiN, TiCN, TiCO and/or TiCNO. One pref. substrate is high speed steel coated at 300-600 deg.C. Another pref. substrate is a hard metal carbide, nitride or carbonitride contg. 2-30% of a metal in the Fe gp., and coated at 300-800 deg.C. Coating is pref. in a vacuum chamber, using evapn.;CVD; ion plating; sputtering; or a low temp. plasma jet. An excellent bond is obtd. on the substrate and the working life of tips is increased.</p> |
