发明名称 POLISHING METHOD OF A SUPPORT
摘要 The method of polishing a support (1) consists in placing between the latter and a shiny polished surface of a polymeric film (3) pervious to a radiation ionising a layer (2) of an ink or varnish which is polymerised by this radiation. The polymerisation is carried out by the exposure of the aggregate to an ionising radiation issuing from a source of radiation (7) whilst passing through a calender (8, 9). The polymeric film is delivered from a reel (5) and rewound on another reel after its passage through the calender. The polishing of varnised or printed support is thus achieved continously.
申请公布号 DE3028507(A1) 申请公布日期 1981.02.26
申请号 DE19803028507 申请日期 1980.01.22
申请人 SICPA HOLDING SA;AMON A 发明人 AMON A
分类号 B05D3/00;B05D3/06;B05D5/00;B05D5/06 主分类号 B05D3/00
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