发明名称 |
Epitaxial wafer for use in production of light emitting diode |
摘要 |
An epitaxial wafer of GaAs1-xPx has been doped with nitrogen and used for the production of light emitting diode (LED). The carrier concentration of the conventional GaAs1-xPx was from 3x1016 to 2x1017/cm3. According to the present invention, the carrier concentration is reduced lower than the conventional concentration and the luminance of LED is increased approximately two or three times the conventional luminance.
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申请公布号 |
US4252576(A) |
申请公布日期 |
1981.02.24 |
申请号 |
US19790055377 |
申请日期 |
1979.07.06 |
申请人 |
MITSUBISHI MONSANTO CHEMICAL CO. |
发明人 |
HASEGAWA, SHINICHI;FUJITA, HISANORI |
分类号 |
C30B25/02;C30B29/42;H01L21/205;H01L33/16;H01L33/30;H01L33/34;(IPC1-7):H01L29/12;H01L21/20 |
主分类号 |
C30B25/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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