发明名称 Epitaxial wafer for use in production of light emitting diode
摘要 An epitaxial wafer of GaAs1-xPx has been doped with nitrogen and used for the production of light emitting diode (LED). The carrier concentration of the conventional GaAs1-xPx was from 3x1016 to 2x1017/cm3. According to the present invention, the carrier concentration is reduced lower than the conventional concentration and the luminance of LED is increased approximately two or three times the conventional luminance.
申请公布号 US4252576(A) 申请公布日期 1981.02.24
申请号 US19790055377 申请日期 1979.07.06
申请人 MITSUBISHI MONSANTO CHEMICAL CO. 发明人 HASEGAWA, SHINICHI;FUJITA, HISANORI
分类号 C30B25/02;C30B29/42;H01L21/205;H01L33/16;H01L33/30;H01L33/34;(IPC1-7):H01L29/12;H01L21/20 主分类号 C30B25/02
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